专利名称：Deposition of diamond films发明人：Nigel P. Hacker,George W. Tyndall, III申请号：US07/309521申请日：19890210公开号：US04948629A公开日：19900814
摘要：Diamond films are deposited at substrates below temperatures of 400. degree.C. by chemical vapor deposition using a high powered pulsed laser and a vapor which is analiphatic carboxylic acid or an aromatic carboxylic anhydride.
申请人：INTERNATIONAL BUSINESS MACHINES CORPORATION
代理人：Joseph G. Walsh
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